News

Semiconductor Engineering: Photomask Challenges At 3nm And Beyond

News • January 25, 2022

What are the next lithography-related issues as device scaling continues to the next process nodes? Experts at the Table (with Aki Fujimura of D2S)

Semiconductor Engineering: Luminaries See Growth Opportunities For Photomask Writers

News • January 20, 2022

Sales of new photomask writers are expected to increase across all segments

Semiconductor Engineering: Perspectives On Why EUV Photomasks Are More Expensive

News • December 20, 2021

Pellicles, inspection, and turnaround time are having an impact on EUV photomask cost.

Semiconductor Engineering: Business, Technology Challenges Increase For Photomasks

News • December 16, 2021

Experts at the Table (with Aki Fujimura of D2S)

Semiconductor Engineering: Semiconductor Photomask revenues predicted to increase in 2021

News • November 18, 2021

How the pandemic has impacted the photomask and flat panel display industry

SPIE BACUS Newsletter: Inverse lithography technology: 30 years from concept to practical, full-chip reality

News • November 1, 2021

Journal Review Article by Leo Pang, D2S, and republished in the November 2021 BACUS Newsletter