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Tuesday, June 2, 2020

Leo Pang, Chief Product Officer of D2S, reviews a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO).

Tuesday, March 17, 2020

Aki Fujimura of D2S with SPIE AL 2020 highlights, including EUV, Deep Learning, curvilinear masks

Tuesday, March 17, 2020

Leo Pang of D2S also recaps SPIE-AL 2020 developments

Tuesday, October 15, 2019

Dr. Leo Pang of D2S explains the importance of ILT digital twins in today’s growing curvilinear ILT world

Tuesday, October 15, 2019

Aki Fujimura, CEO of D2S, provides key takeaways from the recent Photomask Technology Conference

Wednesday, June 5, 2019

eBeam Initiative: In this Tech Talk, presented at Photomask Japan, D2S modeling expert Ryan Pearman examines the effects of curvilinear mask data on wafer variability and explains why curvilinear features are needed for EUV lithography.